Continuing Professional Development in Nanoelectronics
MODULE 4: Nano-processing Technology (29/11/10 - 17/12/10)
4.1 Inorganic Semiconductor Processing (12 hours)
This sub-unit provides a detailed review of ‘traditional’ cleanroom processing technologies, used for the fabrication of devices and circuits from inorganic semiconductors such as silicon and the III-Vs (e.g. GaAs, InP).
4.2 Nano-Fabrication (12 hours)
This sub-unit looks at recent and emerging technologies for nano-fabrication in a range of semiconductor materials. It includes processes such as e-beam, X-ray and ion-beam lithography as well as imprint and scanning-probe techniques.
Lab IV: Inorganic Device Processing
For more information, please also see the syllabus description.