- 2011
View content for printing (opens a new page)EEEN40216 - Nano-Processing Technology
Availability - Course (Compulsory/Elective)
Aims
The programme unit aims to:
Give a detailed review of a wide range of topics relating to the traditional semiconductor processing technologies, the limitation and possible extensions of the conventional photolithography technique, and a number of emerging technologies of nano-fabrication.
Brief Description
BRIEF DESCRIPTION OF THE UNIT
Traditional Semiconductor Processing
This sub-unit provides a detailed review of 'traditional' cleanroom processing technologies, used for the fabrication of devices and circuits from inorganic semiconductors such as silicon and the III-Vs (e.g. GaAs, InP).
Nano-Fabrication Techniques
This sub-unit looks at recent and emerging technologies for nano-fabrication of semiconductor nanodevices and circuits. It first provides an overview of the limitations/extensions of conventional photolithography technique and the need for development of nanolithography. The topics include nano-processes such as electron-beam lithography, focused ion-beam lithography, stamp-based nanolithography, and scanning-probe-based techniques.
Learning Outcomes
Students will be able to:
Knowledge and understanding
1.The principles and techniques of traditional semiconductor processing.
2.The principles and techniques of nanolithography that are applicable to nanoelectronics.
Intellectual skills
1.The ability to evaluate and critically analyse conventional and state-of-the-art device and integrated circuit manufacturing techniques.
2.The ability to select and design for fabrication with different semiconductor nano-process technologies.
Practical skills
1.Laboratory fabrication of semiconductor devices.
Transferable skills and personal qualities
1.Knowledge of typical electronic industry manufacturing processes.
2.Ability to identify and assess critical parameters e.g. resolution/yield/throughput/cost etc. in a high tech manufacturing process.
3.Report writing.
Teaching & Learning Process (Hours Allocated To)
Lectures |
Tutorials/Example Classes |
Practical Work/Laboratory |
Private Study |
Total |
|---|---|---|---|---|
| 30 | 0 | 6 | 114 | 150 |
Assessments
Unseen Written Examination
The form of the examination: 2 long multi-sectioned questions, answer all questions
Length of examination: 3 hours
Calculators are permitted in this examination
The unseen written examination forms 70% of the total unit assessment
Course work-Laboratories
The number of laboratories: 2
The length of each laboratory: 3 hours
Laboratories are assessed by a written report
The maximum mark for each laboratory forms 30% of the overall unit mark
Staff Involved
| Prof Aimin Song | - | Lecturer |